Tokyo Electron Ltd - Company Profile
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View up-to-date information on Tokyo Electron Ltd patents, including inventor and filing insights.
Patent Trends
Publication Identifier | Document Type | Title | Classification-CPC | Publication Date |
---|---|---|---|---|
CN115066742A | Application | 基片处理方法和基片处理系统 | H01L21/027; H01L21/3065 | September 16, 2022 |
CN115066314A | Application | 加工方法以及加工装置 | B24B49/02; B24B7/00; H01L21/304 | September 16, 2022 |
CN115066735A | Application | 使用低频偏置脉冲的等离子体加工方法 | H01J2237/3341; H01J37/32082; H01J37/321; H01J37/32128; H01J37/32146; H01J37/32165; H01J37/32697; H01J37/32715; H01L21/3065; H01L21/31116; H01L21/32136; H01L21/67069; H01L21/6833 | September 16, 2022 |
WO2022190924A1 | Application | SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD | September 15, 2022 | |
WO2022192362A1 | Application | 3D DEVICE WITH A PLURALITY OF CORE WIRING LAYOUT ARCHITECTURE | H01L21/8221; H01L21/823487; H01L27/0688; H01L29/1037; H01L29/66666; H01L29/7827 | September 15, 2022 |
Top Inventors by Filings (Count by publication)
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